Graphene Chemical Vapor Deposition (CVD)
This system is configured to grow graphene on copper substrates using methane along with hydrogen and argon gases in a three-zone tube furnace. Foils are available in the MNC office.
Current capabilities: Single-layer graphene growth on up to 2 x 2 in2 Cu foils and techniques for graphene transfer onto a variety of substrates.
Tool location: Area 1 of the Keller Hall cleanroom
Tool expert: Steven Koester.
Transition metal dichalcogenide (TMD) growth
A custom tool that has two growth tubes configured for sulfides and selenides, along with a UHV transfer system to move samples between the tubes. The system is housed in a walk-in hood.
Current capabilities: MoS2 single crystal growth up to 470 µm on a side, MoS2 monolayer films up to 1 mm on a side, and WSe2 growth.
Tool Location: Bay 1 of the PAN cleanroom
Tool expert: Steve Koester
2D Material Processing Glovebox
This system allows users to transfer and align 2D materials in a low-oxygen environment.
Tool location: Bay 1 of the PAN cleanroom.